SK Hynix Plans to Produce 3D NAND at -70°C : Could Achieve Upto 400 Layers
#1

Traditionally, etching vertical holes in semiconductor structures has been a major challenge due to limitations in existing etching equipment. SK Hynix’s adoption of TEL’s new low-temperature etching tools opens up exciting possibilities by allowing for deeper memory channel holes with excellent uniformity.

Read More here💡

https://techovedas.com/sk-hynix-plans-to...00-layers/
[Image: b8aec5cd64a2931ebb14f2412a6b8dad-high-Res.jpg]
Reply


Forum Jump:


Users browsing this thread: 1 Guest(s)